25.2 mm Fused Silica Optical Filter

This 532 nm notch filter is designed for applications in fluorescence microscopy and medical imaging, effectively blocking unwanted wavelengths while allowing specific light to pass through. With a surface quality of 60/40, it ensures minimal distortion and high clarity in imaging applications. The filter’s compatibility with the 400-700 nm band makes it suitable for various light sources and detectors in research and industrial settings.

Key Features

• Center Wavelength: 532 nm for optimal fluorescence application fit.
• Notch filter type effectively blocks unwanted wavelengths, enhancing image clarity.
• Surface Quality: 60/40 for minimal distortion in imaging.
• Tolerance: ±0.2 mm for precise fitting in optical setups.
• Durable Fused Silica substrate ensures longevity in demanding environments.

Applications

Fluorescence, Microscopy, Medical

Specification Summary

Full Specifications

FAQ

Is custom sizing available?

Custom sizing is not available for this filter.

What is the minimum order quantity?

There is no minimum order quantity specified for this filter.